Nd:YVO₄

Nd:YVO₄

Applications

  • Stage laser
  • Laser medicali
  • Laser industriali

Advantages

  • High absorption coefficient
  • Low threshold and high slope efficiency
  • Wide pump bandwidth
  • Uniaxial crystal, the output is linearly polrized

Specifications

Properties
Dimension tolerance (mm)W(+/-0.1) * H(+/-0.1)*L(+0.5/-0.1)mm
Dopant0.1% ~ 3%OrientationA-CUT +/-0.5°
Parallelism≤10"Chamfer≤0.2mmx45°
Flatnessλ/10@633nmPerpendicularity≤10'
Wavefront distortionλ/10@633nmChips<0.1mm
Surface quality10/5Clear aperture≥95%
CoatingsC1: AR@1064(R<0.2%)
C2: AR@1064(R<0.2%)@532 (R<0.5%)
C3: AR@1064(R<0.2%)&808 (R<0.5%)
C4: AR@1064(R<0.2%)&532(R<0..5%) &808(R<3%)
C5: HR@1064(R>99.8%)&HT@808(T>95%)
C6: HR@1064(R>99.8%)&532(R>99.5%)&HT(T>95%)
Damage threshold1GW/cm² 10ns 10Hz at 1064nm

Standard products

P/NDopantOrientationDimension (mm)Coating
NYV-20-3301-C6/C22%A-CUT3x3x1S1: HR@1064&532&HT@808nm
S2: AR@1064&532nm
NYV-10-3302-C6/C21%A-CUT3x3x2S1: HR@1064&532&HT@808nm
S2: AR@1064&532nm
NYV-10-3303-C6/C21%A-CUT3x3x3S1: HR@1064&532&HT@808nm
S2: AR@1064&532nm
NYV-07-3303-C6/C20.7%A-CUT3x3x3S1: HR@1064&532&HT@808nm
S2: AR@1064&532nm
NYV-07-3303-C4/C20.7%A-CUT3x3x3S1: HR@1064&532&808nm
S2: AR@1064&532nm
NYV-07-3305-C4/C20.7%A-CUT3x3x5S1: HR@1064&532&808nm
S2: AR@1064&532nm
NYV-05-3305-C5/C10.5%A-CUT3x3x5S1: HR@1064&808nm
S2: AR@1064nm
NYV-05-3310-C3/C10.5%A-CUT3x3x10S1: HR@1064&808nm
S2: AR@1064nm
NYV-03-3310-C3/C10.3%A-CUT3x3x10S1: HR@1064&808nm
S2: AR@1064nm
NYV-03-3312-C3/C10.3%A-CUT3x3x12S1: HR@1064&808nm
S2: AR@1064nm
NYV-027-3310-C3/C10.27%A-CUT3x3x10S1: HR@1064&808nm
S2: AR@1064nm
NYV-027-3312-C3/C10.27%A-CUT3x3x12S1: HR@1064&808nm
S2: AR@1064nm
NYV-02-3310-C3/C10.2%A-CUT3x3x10S1: HR@1064&808nm
S2: AR@1064nm
NYV-02-3312-C3/C10.2%A-CUT3x3x12S1: HR@1064&808nm
S2: AR@1064nm

Non-Standard products

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